Dry Pump


ULVAC offers the superior dry pump series for all semiconductor and Flat Panel Display (FPD) manufacturing processes. The LR / HR / UR series have high durability in the hard processes of CVD, etching etc.









ULVAC Dry Vacuum Pump - CR Series

Dry Vacuum Pump -
CR Series

Dry Vacuum Pump CR series is an air-cooled roots type dry vacuum pump. Stable operation and extended lifetime are possible because there is no oil inside of the pump head and no contact between rotor and cylinder.








ULVAC Dry Vacuum Pump - GR Series

Dry Vacuum Pump -
GR Series

Based on many years of experience with the LR/HR Series ULVAC has introduced the GR Series Dry Vacuum pump with a simple and clean design for general industrial applications.








ULVAC Dry Vacuum Pump - LR / HR / UR Series

Dry Vacuum Pump -
LR / HR / UR Series

ULVAC's unique approach to utilize the generated heat from within the dry pump body allows the LR / HR / UR series to perform even in the most stringent processes. ULVAC has focused the design efforts into maintaining an extremely uniform high temperature throughout all pump stages making this series pump optimal for Chemical Vapor Deposition (CVD) and etch applications.

ULVAC's ECO-SHOCK can be added to the LR pump for additional energy savings of up to 70% for any light processes including pumping air or nitrogen.








ULVAC Power Saving Accessory for Dry Pumps - ECO-SHOCK ES10

Power Saving Accessory for Dry Pumps -
ECO-SHOCK ES10

ECO-SHOCK is a revolutionary dry pump accessory that can dramatically reduce power consumption by attaching to the dry pump exhaust line.








ULVAC Power Saving Accessory for Dry Pumps - ECO-SHOCK ES4A

Power Saving Accessory for Dry Pumps -
ECO-SHOCK ES4A

ECO-SHOCK is a revolutionary dry pump accessory that can reduce power consumption by attaching to the dry pump exhaust line.

ES4A is optimal model for the power saving and reduction of dry pump for the frequently air exhaust of Load/Unload chamber or for back pump of turbo-molecular pump which takes long time to reach to the ultimate pressure.

Patent is registered (China, Japan, Korea, Singapore, Taiwan)